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Central Michigan University Scholarly & Creative Works > CMU Graduate Research (Theses and Dissertations) > 2010, Thesis

Recursor Design for the Atomic Layer Deposition (A..., 2010

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Title Recursor Design for the Atomic Layer Deposition (ALD) of Hafnium Oxide Thin Films
Date 2010
Material Type Thesis
Creator/Author Kalapugama, Suneth
Copyright Copyright 2010 by Suneth Kalapugama. In accordance with Title 17 of the United States Code, Copyright Law of the United States of America, this material is copyrighted, and any further reproduction or distribution is prohibited without the permission of the copyright owner.
Subject Hafnium compounds; Dielectric films; Thin films;
Description Thesis (M.S.)--Central Michigan University, 2010. xiv, 78 leaves : ill. Includes bibliographic references (leaves 77-78).
Language English
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