Residual Stress Measurement of Polycrystalline Sil..., 2010

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Metadata

Title
Residual Stress Measurement of Polycrystalline Silicon by X-Ray Diffraction
Date
2010
Material Type
Thesis
Creator/Author
Hadd, John W.
Copyright
Copyright 2010 by John W. Hadd. In accordance with Title 17 of the United States Code, Copyright Law of the United States of America, this material is copyrighted, and any further reproduction or distribution is prohibited without the permission of the copyright owner.
Subject
Residual stresses; X-rays -- Diffraction; Silicon crystals;
Description
Thesis (M.S.)--Central Michigan University, 2010. ix, 53 leaves : ill. Includes bibliographic references (leaves 52-53).
Language
English
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